MPCVD-Plasma RF Plasma-Assisted CVD System - Microphase Co., Ltd.

RF Plasma-Assisted CVD System

MPCVD-Plasma

Ionization of gas or precursor by plasma

Outline:
Thermal CVD system equipped with a RF-coil at the upper stream, which leads to effective ionization of input gases or precursors, and assists effective CVD reactions. 　We will fabricate the system with customized specifications to meet to your purposes. Please contact us for your detail requests.

1147-9 Onigakubo, Tsukuba-city, Ibaraki 300-2651 JAPAN
PHONE：+81-29-848-3322 / FAX：+81-29-848-3323
CONTACT：infor@microphase.co.jp
URL：http://www.microphase.jp

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Company Overview

High Dispersion CNT
Long Length CNT
Ultra High Crystallization CNT
Carbon Microcoil
Vertically-Aligned CNT on Single Side of Substrates
Vertically-Aligned CNT on Both Sides of Metal Foils
Vertically-Aligned CNT on Meshes
Vertically-Aligned CNT Transferred to Polymer sheets
CNT Black Body (The Lowest Reflection Device)
CNT Electrode Plate (CNT on Cu Electrode)
Stretchable Elastomer Electrode Sheet
CNT Dispersed Aqueous Solution
Si-Embedded Porous Carbon for Negative Electrode Material of LIB
Carbon-Coated Si Negative Electrode Material of LIB
Porous SiC for Semiconductor Power Device
Al/CNT Composite for H2 Generation from Water
Pt-Supported CNT for Fuel Cell
Nitrogen-Doped CNT for Fuel Cell
CNT-Composited Ceramic Sintered Compact
TiO2 Nano Fiber
TiC & TiO2 Microcoil